The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Nov. 02, 2016
Applicant:

Thomson Licensing, Issy les Moulineaux, FR;

Inventors:

Eduardo Perez Pellitero, Hannover, DE;

Jordi Salvador Marcos, Hamburg, DE;

Javier Ruiz Hidalgo, Barcelona, ES;

Bodo Rosenhahn, Ronnenberg, DE;

Assignee:

THOMASON Licensing, Issy-les-Moulineaux, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 3/40 (2006.01); G06K 9/42 (2006.01); G06K 9/46 (2006.01); G06K 9/62 (2006.01); G06K 9/66 (2006.01); G06T 1/00 (2006.01); G06T 3/60 (2006.01);
U.S. Cl.
CPC ...
G06T 3/4076 (2013.01); G06K 9/42 (2013.01); G06K 9/4647 (2013.01); G06K 9/6215 (2013.01); G06K 9/6223 (2013.01); G06K 9/66 (2013.01); G06T 1/0007 (2013.01); G06T 3/4053 (2013.01); G06T 3/602 (2013.01); G06T 2207/20021 (2013.01); G06T 2207/20081 (2013.01);
Abstract

Image super-resolution (SR) generally enhance the resolution of images. One of SR's main challenge is discovering mappings between low-resolution (LR) and high-resolution (HR) image patches. The invention learns patch upscaling projection matrices from a training set of images. Input images are divided into overlapping patches, which are normalized and transformed to a defined orientation. Different transformations can be recognized and dealt with by using a simple 2D-projection. The transformed patches are clustered, and cluster specific upscaling projection matrices and corresponding cluster centroids determined during training are applied to obtain upscaled patches. The upscaled patches are assembled to an upscaled image.


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