The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Oct. 27, 2010
Viswesvaran Janakiraman, San Jose, CA (US);
Chris Chih-chen Lin, San Jose, CA (US);
Mohankumar R. Tiruvayapadi, Fremont, CA (US);
Viswesvaran Janakiraman, San Jose, CA (US);
Chris Chih-Chen Lin, San Jose, CA (US);
Mohankumar R. Tiruvayapadi, Fremont, CA (US);
Veritas Technologies LLC, Mountain View, CA (US);
Abstract
Embodiments of the present invention are directed to a method and system for optimizing mirror creation. The method includes receiving, within an electronic system, a request for creating a mirror of a portion of a volume and accessing a data structure comprising information about a plurality of regions of the volume. The method further includes determining a plurality of regions comprising non-zeros of the volume based on the data structure and copying only the plurality of regions comprising non-zeros to create the mirror.