The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Dec. 22, 2015
Franwell, Inc., Lakeland, FL (US);
Dilek Dagdelen Uysal, Lakeland, FL (US);
Jeffrey Lane Wells, Lakeland, FL (US);
Edward Holcomb, Needham, MA (US);
FRANWELL, INC., Lakeland, FL (US);
Abstract
Embodiments of the present invention relate to a mass resolving aperture that may be used in an ion implantation system. Embodiments of the present invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the present invention also relate to the filtering of a flow of charged particles through a closed plasma channel ('CPC') superconductor, or boson energy transmission system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile