The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
May. 20, 2013
Applicant:
Mitsubishi Heavy Industries, Ltd., Tokyo, JP;
Inventors:
Assignee:
MITSUBISHI HEAVY INDUSTRIES, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 4/06 (2016.01); C23C 4/12 (2016.01); C23C 24/04 (2006.01); C23C 4/18 (2006.01);
U.S. Cl.
CPC ...
C23C 4/128 (2013.01); C23C 4/06 (2013.01); C23C 4/18 (2013.01); C23C 24/04 (2013.01);
Abstract
A method for depositing a layer includes repeatedly performing a unit deposition process until the layer on a deposition target reaches a predetermined thickness. The unit deposition process includes (A) placing the deposition target in a chamber, (B) providing a non-oxidizing gas atmosphere or a vacuum atmosphere in the chamber, (C) depositing the layer on the deposition target by a cold spray process in the non-oxidizing gas atmosphere or the vacuum atmosphere, and (D) heat treating the deposition target after the depositing.