The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Mar. 28, 2011
Applicants:

Adam D. Polcyn, Pittsburgh, PA (US);

Andrew V. Wagner, Pittsburgh, PA (US);

Harry Buhay, Allison Park, PA (US);

Abhinav Bhandari, Cranberry, PA (US);

James J. Finley, Pittsburgh, PA (US);

Paul R. Ohodnicki, Jr., Allison Park, PA (US);

Dennis J. O'shaughnessy, Allison Park, PA (US);

Jeffrey A. Benigni, McGrann, PA (US);

Paul A. Medwick, Allison Park, PA (US);

James P. Thiel, Pittsburgh, PA (US);

Inventors:

Adam D. Polcyn, Pittsburgh, PA (US);

Andrew V. Wagner, Pittsburgh, PA (US);

Harry Buhay, Allison Park, PA (US);

Abhinav Bhandari, Cranberry, PA (US);

James J. Finley, Pittsburgh, PA (US);

Paul R. Ohodnicki, Jr., Allison Park, PA (US);

Dennis J. O'Shaughnessy, Allison Park, PA (US);

Jeffrey A. Benigni, McGrann, PA (US);

Paul A. Medwick, Allison Park, PA (US);

James P. Thiel, Pittsburgh, PA (US);

Assignee:

Vitro, S.A.B. de C.V., Nuevo León, MX;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 17/06 (2006.01); C03C 17/36 (2006.01);
U.S. Cl.
CPC ...
C03C 17/36 (2013.01); C03C 17/366 (2013.01); C03C 17/3618 (2013.01); C03C 17/3639 (2013.01); C03C 2217/42 (2013.01); Y10T 428/12542 (2015.01); Y10T 428/12549 (2015.01); Y10T 428/24851 (2015.01); Y10T 428/24917 (2015.01);
Abstract

An architectural transparency includes a substrate, a first dielectric layer formed over at least a portion of the substrate, a continuous metallic layer formed over at least a portion of the first dielectric layer, a second dielectric layer formed over at least a portion of the first metallic layer, and a subcritical metallic layer formed over at least a portion of the second dielectric layer such that the subcritical metallic layer forms discontinuous metallic regions.


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