The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Oct. 15, 2014
Applicant:

Slm Solutions Gmbh, Luebeck, DE;

Inventors:

Andreas Wiesner, Luebeck, DE;

Henner Schoeneborn, Luebeck, DE;

Dieter Schwarze, Luebeck, DE;

Assignee:

SLM Solutions Group AG, Luebeck, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 67/00 (2017.01); B22F 3/105 (2006.01); B29C 64/153 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 40/00 (2015.01); B29L 9/00 (2006.01);
U.S. Cl.
CPC ...
B29C 67/0077 (2013.01); B22F 3/1055 (2013.01); B29C 64/153 (2017.08); B22F 2003/1056 (2013.01); B29L 2009/00 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12); Y02P 10/295 (2015.11);
Abstract

Method and apparatus for producing a large three-dimensional work piece. In a method for producing a three-dimensional work piece, a layer of raw material powder is applied onto a carrier () accommodated within a process chamber () by means of a powder application device (), wherein a plurality of irradiation areas () is defined on a surface of the carrier (). Electromagnetic or particle radiation is selectively irradiated onto the raw material powder applied onto the carrier () by means of an irradiation system (), the irradiation system () comprising a plurality of irradiation units (), each irradiation unit () being associated with one of the irradiation areas () defined on the surface of the carrier () and being configured to selectively irradiate electromagnetic or particle radiation onto the raw material powder applied onto the associated irradiation area (). Fresh gas is supplied to the process chamber () by means of a gas inlet system (), and gas containing particulate impurities is discharged from the process chamber () by means of a gas outlet system () such that a gas flow pattern is generated within the process chamber, the gas flow pattern being configured such that each irradiation area () defined on the surface of the carrier () is overflown with fresh gas which is supplied to the process chamber () via the gas inlet system () and which, after having overflown the irradiation area (), is discharged from the process chamber () as gas containing particulate impurities via the gas outlet system ().


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