The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Oct. 16, 2013
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Frederic Amstoutz, Strasbourg, FR;

Vincent Schaal, Geispolsheim, FR;

Assignee:

MERCK PATENT GMBH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L 9/00 (2006.01); B01D 69/10 (2006.01); B01D 65/00 (2006.01); B01D 63/08 (2006.01); C12M 1/00 (2006.01); B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
B01L 9/52 (2013.01); B01D 63/087 (2013.01); B01D 65/00 (2013.01); B01D 69/10 (2013.01); B01L 3/5023 (2013.01); C12M 47/02 (2013.01); B01D 2201/24 (2013.01); B01D 2313/025 (2013.01); B01D 2313/56 (2013.01); B01L 2200/025 (2013.01); B01L 2300/0681 (2013.01); B01L 2300/0803 (2013.01);
Abstract

A support apparatus for a filter membrane comprises a base support and a disc-shaped porous support member. The member is removably received in a seat portion of the base support in fluid communication with a drain. A bottom side of the disc-shaped porous support member is supported in a support plane. The bottom side of the member is unsupported in an area and the unsupported area is adjacent to a space in the seat portion of the base support that is located and dimensioned such that application of a force, onto the top side of the member at a location substantially within the boundaries of the unsupported area at the bottom side will cause the member to pivot/tilt into the space and lift above the support plane at a diagonally opposite side from the location where the force is applied so that it can be easily grasped and removed.


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