The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Apr. 21, 2017
Applicant:

Sanken Electric Co., Ltd., Niiza-shi, Saitama, JP;

Inventors:

Taro Kondo, Niiza, JP;

Shunsuke Fukunaga, Niiza, JP;

Shinji Kudo, Niiza, JP;

Assignee:

Sanken Electric Co., LTD., Niiza-shi, Saitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/78 (2006.01); H01L 29/861 (2006.01); H01L 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7804 (2013.01); H01L 29/36 (2013.01); H01L 29/4236 (2013.01); H01L 29/8611 (2013.01);
Abstract

A semiconductor device includes: three or more transistors, which are formed on a semiconductor substrate and arranged in one direction; and a PN junction diode, which is formed in a part of a region between the transistors, wherein the transistor includes: a trench, which is formed inwardly from a front surface; and a conductive region in the trench; wherein a first trench is a trench of the transistor which is not adjacent to the PN junction diode, and a second trench is a trench of one or both of the two transistors adjacent to the PN junction diode, wherein a bottom surface of the first trench is formed in a semiconductor region of a first impurity concentration, and wherein a bottom surface of the second trench is formed in a semiconductor region of a second impurity concentration, which is higher than the first impurity concentration.


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