The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Jun. 25, 2013
Applicant:

Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;

Inventors:

Xavier Baillin, Crolles, FR;

Patrick Leduc, Grenoble, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/498 (2006.01); H01L 21/768 (2006.01); H01L 21/225 (2006.01); H01L 21/265 (2006.01); H01L 21/324 (2006.01); H01L 29/06 (2006.01); H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
H01L 23/49827 (2013.01); H01L 21/225 (2013.01); H01L 21/265 (2013.01); H01L 21/324 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H01L 23/49838 (2013.01); H01L 29/0649 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Receiving structure for electrically connecting a nano-object on a surface thereof and re-establish electrical contact with the nano-object on the opposite surface, and methods for manufacturing the structure. The invention, that can be used for molecular characterisation, makes use of a support () to connect a nano-object () onto its top face and continue the electrical contact on its bottom face. At least two interconnects () pass through the support. The two faces of the support comprise contact continuity zones () for the interconnects. According to the invention, at least the zones () in the top face are doped zones each having a pattern adapted to the fan out of the interconnect associated with it, on this face.


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