The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Mar. 12, 2015
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Akio Yamashita, Kanagawa, JP;

Yumiko Ohno, Kanagawa, JP;

Yuugo Goto, Kanagawa, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); B32B 37/12 (2006.01); B32B 37/24 (2006.01); B32B 38/10 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133516 (2013.01); B32B 37/12 (2013.01); B32B 37/24 (2013.01); B32B 38/10 (2013.01); G02B 5/201 (2013.01); G02B 5/223 (2013.01); B32B 2037/243 (2013.01); B32B 2457/202 (2013.01); B32B 2551/00 (2013.01);
Abstract

To provide a method of manufacturing an optical film formed on a plastic substrate. There is provided a method of manufacturing an optical film including the steps of laminating a separation layer and an optical filter on a first substrate, separating the optical filter from the first substrate, attaching the optical filter to a second substrate. Since the optical film manufactured according to the invention has flexibility, it can be provided on a portion or a display device having a curved surface. Further, the optical film is not processed at high temperatures, and hence, an optical film having high yield with high reliability can be formed. Furthermore, an optical film having an excellent impact resistance property can be formed.


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