The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

May. 06, 2015
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Michael Anthony Lexa, Niskayuna, NY (US);

Meena Ganesh, Niskayuna, NY (US);

John Edward Smaardyk, Kingwood, TX (US);

Donald Kenney Steinman, Missouri City, TX (US);

Assignee:

GENERAL ELECTRIC COMPANY, Schenectady, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 5/12 (2006.01); G01V 5/08 (2006.01); G01T 7/00 (2006.01);
U.S. Cl.
CPC ...
G01V 5/12 (2013.01); G01T 7/005 (2013.01); G01V 5/08 (2013.01);
Abstract

A system for generating eccentering corrected response includes a logging tool configured to examine a material filled in an annular space to generate a tool response. The material is filled in an annular space formed by an outer conduit and an inner conduit disposed in the outer conduit. The logging tool is disposed in an inner conduit. The tool response includes scattered gamma ray photon counts distorted by a radial shift of the logging tool. The system includes a data transmission device coupled to a plurality of detectors and configured to transmit data detected by the plurality of detectors. The system also includes a computer processor linked to the data transmission device and configured to receive the tool response. The computer processor is configured to process the tool response and generate an eccentered corrected response by correcting effects of the radial shift in the tool response using eccentering correction technique.


Find Patent Forward Citations

Loading…