The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Jun. 08, 2016
Applicant:

Siemens Aktiengesellschaft, Munich, DE;

Inventor:

Ralf Bitter, Karlsruhe, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/39 (2006.01); G01N 21/27 (2006.01); G01N 21/3504 (2014.01); G01N 21/15 (2006.01); G01N 21/85 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/39 (2013.01); G01N 21/15 (2013.01); G01N 21/274 (2013.01); G01N 21/3504 (2013.01); G01N 21/85 (2013.01); G01N 33/0026 (2013.01); G01N 2021/151 (2013.01); G01N 2021/8578 (2013.01); G01N 2201/06113 (2013.01); G01N 2201/127 (2013.01);
Abstract

A process gas analyzer and method for analyzing a process gas carried in a plant section, wherein light from a light source is passed through the process gas and detected via a detector, evaluated in an evaluation unit to produce an analysis result with respect to the absorption in the process gas, where chambers or purging pipes, present between the light source and the plant section and also between the detector and the plant section, are flushed with a purge gas to analyze the process gas, and where the volume flow rate of the purge gas is periodically modulated and the effect of the purge gas on the analysis result is determined based on changes in the detected absorption caused by the modulation and removed from the analysis result to enable a high degree of compensation for measurement errors caused by the purging.


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