The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Dec. 21, 2011
Applicants:

Uwe Hermanns, Karlstein am Main, DE;

Neil Morrison, Darmstadt, DE;

Tobias Stolley, Oberursel, DE;

Volker Hacker, Altenstadt-Oberau, DE;

Inventors:

Uwe Hermanns, Karlstein am Main, DE;

Neil Morrison, Darmstadt, DE;

Tobias Stolley, Oberursel, DE;

Volker Hacker, Altenstadt-Oberau, DE;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/503 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/503 (2013.01); C23C 14/54 (2013.01); C23C 14/562 (2013.01); C23C 14/564 (2013.01); C23C 16/4401 (2013.01); C23C 16/52 (2013.01); C23C 16/545 (2013.01);
Abstract

According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.


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