The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
Sep. 05, 2012
Applicant:
Heung Teak Bae, Seoul, KR;
Inventor:
Heung Teak Bae, Seoul, KR;
Assignee:
LG INNOTEK CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/32 (2006.01); C23C 16/458 (2006.01); C30B 25/12 (2006.01); C30B 29/36 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C23C 16/325 (2013.01); C23C 16/458 (2013.01); C23C 16/4588 (2013.01); C30B 25/12 (2013.01); C30B 29/36 (2013.01);
Abstract
Disclosed is a deposition apparatus. The deposition apparatus includes a susceptor into which reactive gas is introduced, and a wafer holder provided in the susceptor to receive a substrate or a wafer. The wafer holder comprises a gas feeding part provided at a lateral side of the wafer holder.
Bae, Heung. (2018). Deposition apparatus (U.S. Patent No. 9926625). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9926625
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile