The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
Jan. 30, 2015
Applicant:
Sumitomo Metal Mining Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SUMITOMO METAL MINING CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/16 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C04B 35/01 (2006.01); C04B 35/626 (2006.01);
U.S. Cl.
CPC ...
C04B 35/16 (2013.01); C04B 35/01 (2013.01); C04B 35/6261 (2013.01); C23C 14/08 (2013.01); C23C 14/3414 (2013.01); C04B 2235/3232 (2013.01); C04B 2235/3286 (2013.01); C04B 2235/3293 (2013.01); C04B 2235/5445 (2013.01); C04B 2235/656 (2013.01); C04B 2235/728 (2013.01); C04B 2235/77 (2013.01); C04B 2235/80 (2013.01); C04B 2235/95 (2013.01); C04B 2235/96 (2013.01); C04B 2235/9623 (2013.01);
Abstract
The present invention provides: an oxide sintered body having superior manufacturing stability, film stability, discharge stability, and mechanical strength; a process for manufacturing the same; and an oxide film obtained by using the oxide sintered body and having an intermediate refractive index. The oxide sintered body comprising In and Si, wherein a Si content is 0.65 to 1.75 in Si/In atomic ratio, a relative density is 90% or more, and a bending strength is 90 N/mmor more, is manufactured, and the oxide film with refractive index of 1.70 to 1.90 by a sputtering process using the oxide sintered body is manufactured.