The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
Apr. 18, 2016
BO Liu, Spokane Valley, WA (US);
Hongjie Qiu, Milpitas, CA (US);
Bo Liu, Spokane Valley, WA (US);
Hongjie Qiu, Milpitas, CA (US);
Other;
Abstract
A gas atomization apparatus is disclosed for producing high purity fine refractory compound powders. After the system reaches high vacuum, a first stage inert atomizing gas breaks superheated metal melt into droplets and a second stage reactive atomizing gas breaks the droplets further into ultrafine droplets while reacts with them to form refractory compound powders. The first stage atomizing gas is inert gas able to break up melt into droplets and prevent crust formation on the nozzle front. A reaction time enhancer is arranged at bottom of reaction chamber to furnish a reactive gas flow in a reverse direction of the falling droplets and powders. Under the reverse gas flow, the falling droplets and powders change moving direction and travel longer distance in reaction chamber to increase reaction time. This apparatus can produce refractory powders with ultrahigh purity and uniform powder size while maintain high process energy efficiency.