The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2018

Filed:

Jun. 14, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tomohiro Takahashi, Yokohama, JP;

Toru Kawaguchi, Ebina, JP;

Toshiyasu Sakai, Kawasaki, JP;

Masataka Kato, Hiratsuka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/71 (2006.01); H01L 21/304 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1635 (2013.01); B41J 2/162 (2013.01); B41J 2/1628 (2013.01); B41J 2/1631 (2013.01); B41J 2/1634 (2013.01);
Abstract

A method of manufacturing a plurality of semiconductor chips for a liquid discharge head from a substrate includes forming trenches of a linear form through etching from the second surface along intended cutting portions, forming modified portions in the substrate by irradiating a laser beam from the first surface side along the intended cutting portions, and splitting the substrate into the plurality of semiconductor chips for a liquid discharge head, by cutting the substrate with stress applied to the modified portions. The intended cutting portions include inclined portions extending in a direction inclined with respect to a crystal orientation plane of the substrate and uninclined portions extending in a direction along the crystal orientation plane of the substrate, and the trenches are formed at least along the inclined portions.


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