The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2018

Filed:

Sep. 15, 2016
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Alexis Bavard, Grenoble, FR;

Matthew Charles, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/00 (2006.01); H01L 29/15 (2006.01); H01L 21/02 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/207 (2006.01);
U.S. Cl.
CPC ...
H01L 29/155 (2013.01); H01L 21/0254 (2013.01); H01L 21/0257 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02428 (2013.01); H01L 21/02433 (2013.01); H01L 21/02458 (2013.01); H01L 21/02507 (2013.01); H01L 21/02579 (2013.01); H01L 29/7786 (2013.01); H01L 29/2003 (2013.01); H01L 29/207 (2013.01); H01L 29/778 (2013.01);
Abstract

A semiconductor structure including a substrate, a buffer layer, a superlattice formed on the buffer layer, the superlattice including a pattern including n layers made of different materials, n being at least equal to 2, each layer including an AlGaInBN type material where x+y+w+z=1, the thickness of each layer being less than the critical thickness thereof, the number of patterns being at least equal to 50, an insert layer wherein the material has a first lattice parameter, a layer of GaN material, wherein the lattice parameter is greater than the first lattice parameter such that the layer of GaN material is compressed by the insert layer.


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