The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Mar. 27, 2014
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventor:
Yousuke Endo, Ibaraki, JP;
Assignee:
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); B22D 21/00 (2006.01); C22C 28/00 (2006.01); C22F 1/16 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01); B22D 21/02 (2006.01); B22D 27/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); B22D 21/00 (2013.01); B22D 21/007 (2013.01); B22D 21/027 (2013.01); B22D 27/08 (2013.01); C22C 28/00 (2013.01); C22F 1/16 (2013.01); C23C 14/14 (2013.01); C23C 14/3414 (2013.01); H01J 37/3423 (2013.01);
Abstract
A sputtering target according to the disclosure includes 5 wtppm to 10,000 wtppm of Cu and the balance of In and has a relative density of 99% or more and an average grain size of 3,000 μm or less.