The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Apr. 30, 2013
Royal Canadian Mint, Ottawa, CA;
Signoptic Technologies, Le Bourget du Lac, FR;
Hieu Truong, Orleans, CA;
Yann Boutant, Chindrieux, FR;
Arjo Solutions, Levellois-Perrett, FR;
Royal Canadian Mint, Ottawa, Ontario, CA;
Abstract
A method of producing an authenticatable article. An overt feature is produced in the article using a fabricating technique which is selected based on a material of the article so as to produce the overt feature having predetermined, reproducible macroscopic characteristics as well as random, non-reproducible microscopic characteristics rendering the article physically unique. The overt feature including the microscopic characteristics are imageable using a predetermined imaging technology to produce an overt feature image. An authentication signature is generated based on the overt feature image and stored in a central database. The overt feature may alternatively be produced in an apparatus or means used to manufacture authenticatable articles such that the overt feature including the random, microscopic characteristics is reproduced in the articles. The overt feature and generated authentication code therefore corresponds to articles manufactured using that apparatus or means.