The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2018

Filed:

Nov. 18, 2016
Applicant:

J.a. Woollam Co., Inc, Lincoln, NE (US);

Inventors:

Martin M. Liphardt, Lincoln, NE (US);

Jeffrey S. Hale, Lincoln, NE (US);

Ping He, Lincoln, NE (US);

Galen L. Pfeiffer, Roca, NE (US);

Assignee:

J.A. WOOLLAM CO., INC., Lincoln, NE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 17/06 (2006.01); G02B 27/00 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0663 (2013.01); G01N 21/211 (2013.01); G02B 27/0012 (2013.01); G01N 2021/213 (2013.01); G01N 2201/0636 (2013.01);
Abstract

A reflective optics system that requires the presence of both convex and a concave mirrors that have beam reflecting surfaces. Application thereof achieves focusing of a beam of electromagnetic radiation with minimized effects on a polarization state of an input beam state of polarization that results from adjustment of angles of incidence and reflections from the various mirrors involved. This invention is also a combination of a focusing element and a filtering element that provides an optimum electromagnetic beam cross-sectional area based on optimizing the beam cross-sectional area in view of conflicting effects of aberration and diffraction inherent in said focusing element, which, for each wavelength, vary oppositely to one another with electromagnetic beam cross-sectional area.


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