The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2018

Filed:

Mar. 11, 2014
Applicant:

Westport Power Inc., Vancouver, CA;

Inventors:

Gregory A. Batenburg, Delta, CA;

Jason J. Coatta, Burnaby, CA;

Assignee:

Westport Power Inc., Vancouver, CA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F02B 39/04 (2006.01); F02M 21/06 (2006.01); F02M 21/02 (2006.01); F23K 5/22 (2006.01); F17C 7/04 (2006.01); F23K 5/00 (2006.01); F02M 31/18 (2006.01); F17C 9/02 (2006.01); F02B 1/04 (2006.01); F02B 43/10 (2006.01); F28F 27/00 (2006.01);
U.S. Cl.
CPC ...
F02M 21/06 (2013.01); F02M 21/02 (2013.01); F02M 21/029 (2013.01); F02M 21/0218 (2013.01); F02M 21/0287 (2013.01); F02M 31/183 (2013.01); F17C 7/04 (2013.01); F17C 9/02 (2013.01); F23K 5/002 (2013.01); F23K 5/22 (2013.01); F02B 1/04 (2013.01); F02B 43/10 (2013.01); F02B 2043/103 (2013.01); F17C 2227/0135 (2013.01); F17C 2227/0142 (2013.01); F17C 2250/0631 (2013.01); F23K 2401/10 (2013.01); F23K 2401/20 (2013.01); F23K 2900/01041 (2013.01); F28F 27/00 (2013.01); Y02T 10/126 (2013.01); Y02T 10/16 (2013.01); Y02T 10/32 (2013.01);
Abstract

A reciprocating piston cryogenic pump has been suspended from stroking when process fluid discharge temperature from a vaporizer dropped below a threshold to prevent freezing of a heat exchange fluid circulating through the vaporizer and damage to downstream components. Suspension of the pump results in a decrease of process fluid pressure downstream of the vaporizer, which is undesirable. In the present technique, a temperature is monitored correlating to process fluid temperature downstream of the vaporizer. The amount of process fluid discharged from the pump in each cycle is adjusted as a function of the temperature such that the average residence time of the process fluid in the vaporizer is increased as the discharge amount decreases, increasing process fluid discharge temperature. The average mass flow rate of the process fluid through the vaporizer is unchanged regardless of pump discharge amount such that process fluid pressure downstream of the vaporizer is maintained.


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