The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Dec. 09, 2013
Applicant:
Empire Technology Development Llc, Wilmington, DE (US);
Inventors:
Kraig Anderson, Burlingame, CA (US);
Angele Sjong, Louisville, CO (US);
Assignee:
EMPIRE TECHNOLOGY DEVELOPMENT LLC, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); C01B 31/04 (2006.01); B05D 1/00 (2006.01); B05D 1/02 (2006.01); B05D 1/18 (2006.01); B05D 1/28 (2006.01); H01J 37/32 (2006.01); H01L 21/04 (2006.01); H01L 29/16 (2006.01); C01B 32/194 (2017.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
C01B 31/0484 (2013.01); B05D 1/005 (2013.01); B05D 1/02 (2013.01); B05D 1/18 (2013.01); B05D 1/28 (2013.01); C01B 32/194 (2017.08); H01J 37/32009 (2013.01); H01L 21/042 (2013.01); H01L 29/1606 (2013.01); H01J 2237/334 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01);
Abstract
Techniques described herein generally relate to etching graphene. The techniques can include disposing graphene on a patterned substrate, applying a resist to the graphene on the patterned substrate, curing the resist, and etching exposed portions of the graphene. Graphene composites including patterned substrates, graphene disposed on the patterned substrate, and a resist disposed on the graphene, are disclosed. Systems configured to perform the methods and/or make the graphene composites are also disclosed.