The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2018

Filed:

Jan. 26, 2015
Applicants:

The Regents of the University of Colorado, a Body Corporate, Denver, CO (US);

Drs Network & Imaging Systems, Llc, Dallas, TX (US);

Inventors:

Victor M. Bright, Boulder, CO (US);

Steven George, Boulder, CO (US);

Joseph J. Brown, Boulder, CO (US);

Nathan T. Eigenfeld, Boulder, CO (US);

Jason M. Gray, Hillsboro, OR (US);

George Dee Skidmore, Richardson, TX (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); B82B 3/00 (2006.01); B81C 1/00 (2006.01); B05D 3/14 (2006.01); B05D 7/24 (2006.01); B82B 1/00 (2006.01); C23C 16/01 (2006.01); C23C 16/02 (2006.01); C23C 16/14 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
B82B 3/008 (2013.01); B05D 3/145 (2013.01); B05D 7/24 (2013.01); B81C 1/0019 (2013.01); B81C 1/00492 (2013.01); B82B 1/005 (2013.01); C23C 16/01 (2013.01); C23C 16/0245 (2013.01); C23C 16/14 (2013.01); C23C 16/403 (2013.01); C23C 16/45525 (2013.01); C23C 16/45555 (2013.01); C23C 16/56 (2013.01); B82Y 30/00 (2013.01); C23C 16/45553 (2013.01); H01L 2924/0002 (2013.01);
Abstract

The present invention relates to novel nano- and micro-electromechanical devices and novel methods of preparing them. In one aspect, the invention includes methods of preparing a nanodevice. In certain embodiments, the methods comprise coating a polymer layer with a first at least one thin solid material layer using atomic layer deposition (ALD), thus forming an ALD-generated layer. In other embodiments, the methods comprise patterning the first at least one thin solid material layer to form a nanodevice. In yet other embodiments, the methods comprise releasing the nanodevice from the polymer layer.


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