The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2018

Filed:

May. 09, 2016
Applicant:

Tela Innovations, Inc., Los Gatos, CA (US);

Inventors:

Michael C. Smayling, Fremont, CA (US);

Scott T. Becker, Scotts Valley, CA (US);

Assignee:

Tela Innovations, Inc., Los Gatos, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 21/027 (2006.01); H01L 27/02 (2006.01); G03F 7/20 (2006.01); G06F 17/50 (2006.01); H01L 27/105 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
H01L 23/528 (2013.01); G03F 7/70383 (2013.01); G06F 17/5068 (2013.01); H01L 21/027 (2013.01); H01L 21/823437 (2013.01); H01L 21/823475 (2013.01); H01L 27/0207 (2013.01); H01L 27/105 (2013.01);
Abstract

A layer of a mask material is deposited on a substrate. A beam of energy is scanned across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is based on a pitch of conductive structure segments to be formed on the substrate. The beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. During scanning the beam of energy across the mask material, the beam of energy is turned on at locations where a conductive structure is to be formed on the substrate, and the beam of energy is turned off at locations where a conductive structure is not to be formed on the substrate.


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