The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Sep. 09, 2016
Omnivision Technologies, Inc., Santa Clara, CA (US);
Sarvesh Swami, San Jose, CA (US);
Donghui Wu, San Mateo, CA (US);
Timofey Uvarov, Milpitas, CA (US);
OmniVision Technologies, Inc., Santa Clara, CA (US);
Abstract
A method for removing a ghost artifact from a multiple-exposure image of a scene method includes steps of generating and segmenting a difference mask, determining a lower threshold and an upper threshold, generating a refined mask, and generating a corrected image. The difference mask includes a plurality of absolute differences in luminance-values between the multiple-exposure image and a first image of the scene. The segmenting step involves segmenting the difference mask into a plurality of blocks. The lower and upper thresholds are based on statistical properties of the blocks. The method generates the refined mask by mapping each absolute difference to a respective one of a plurality refined values, of the refined mask, equal to a function of the absolute difference, the lower threshold, and the upper threshold. The corrected image is a weighted sum of the first image and the multiple-exposure image, weights being based on the refined mask.