The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Aug. 17, 2011
Mathuranathan Viswanathan, Singapore, SG;
Myint Ngwe, Singapore, SG;
Quek Leong Choo, Singapore, SG;
Mathuranathan Viswanathan, Singapore, SG;
Myint Ngwe, Singapore, SG;
Quek Leong Choo, Singapore, SG;
SEAGATE TECHNOLOGY LLC, Cupertino, CA (US);
Abstract
A method and system for providing simultaneous localization of defects in both the time and frequency domain. A high frequency repeating pattern is written on media, and the pattern is read to generate a readback signal, which is converted into ADC samples. The ADC samples are analyzed, in-line, to determine the type of wavelet, level of decomposition, and threshold level for a wavelet transform of the particular readback signal. The wavelet transform provides details and/or approximations (wavelet coefficients) that are analyzed to determine the type, location, and duration of any identified defects. Any noise in the details and/or approximations (wavelet coefficients) is removed by a wavelet based denoising operation. Flags indicating the type, location, and duration of any defects are generated so that the defects may be mapped.