The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Sep. 14, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Hiroo Takizawa, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); C08F 212/14 (2006.01); C08F 12/24 (2006.01); C08F 12/30 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/039 (2006.01); C08F 20/28 (2006.01); C08F 12/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 12/24 (2013.01); C08F 12/30 (2013.01); C08F 212/14 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/32 (2013.01); C08F 12/20 (2013.01); C08F 20/28 (2013.01);
Abstract
There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.