The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Jul. 01, 2014
Applicant:
Xilinx, Inc., San Jose, CA (US);
Inventor:
Toshiyuki Hisamura, San Jose, CA (US);
Assignee:
XILINX, INC., San Jose, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0012 (2013.01);
Abstract
A method for fabricating an interposer wafer includes providing at least one mask having printing regions for forming a plurality of interposer designs; selecting an interposer design; and forming the interposer design on a substrate using a plurality of lithographic imaging steps. For each lithographic imaging step, at least one portion of the interposer design is printed by exposing at least one of the printing regions while blocking at least one other of the printing regions.