The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Feb. 26, 2015
Decision Sciences International Corporation, Poway, CA (US);
Gary Blanpied, Ramona, CA (US);
Sankaran Kumar, San Marcos, CA (US);
Dustin Dorroh, Ramona, CA (US);
Craig Morgan, El Cajon, CA (US);
Michael James Sossong, Ramona, CA (US);
Decision Sciences International Corporation, Poway, CA (US);
Abstract
Techniques, systems, and devices are disclosed for constructing a scattering and stopping relationship of cosmic-ray charged particles (including cosmic-ray electrons and/or cosmic-ray muons) over a range of low-atomic-mass materials, and to detect and identify content of a volume of interest (VOI) exposed to cosmic-ray charged particles based on the constructed scattering and stopping relationship. In one aspect, a process for constructing a scattering-stopping relationship for a range of low-density materials exposed to cosmic-ray charged particles is disclosed. This technique first determines a scattering parameter and a stopping parameter for each material within the range of low-density materials exposed to charged particles from cosmic ray. The technique then establishes a scattering-stopping relationship of cosmic ray charged particles for the range of low-density materials based on the determined pairs of scattering and stopping parameters associated with the range of low-density materials.