The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2018

Filed:

Sep. 10, 2013
Applicant:

Ngk Spark Plug Co., Ltd., Nagoya-shi, Aichi, JP;

Inventors:

Takeshi Sugiyama, Ichinomiya, JP;

Masayuki Motomura, Komaki, JP;

Keisuke Tashima, Kasugai, JP;

Toshiya Matsuoka, Kaizu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 15/10 (2006.01); G01M 15/10 (2006.01); G01N 15/06 (2006.01); G01N 27/70 (2006.01); G01N 33/00 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01M 15/102 (2013.01); G01N 15/06 (2013.01); G01N 15/0656 (2013.01); G01N 27/70 (2013.01); G01N 33/0009 (2013.01); G01N 2015/0046 (2013.01);
Abstract

A particulate sensor () which detects particulates S contained in a gas under measurement (EG) flowing within a gas flow pipe (EP) has a space forming portion () and an ion source (). The space forming portion () projects into the gas flow pipe EP and forms an internal space MX. The space forming portion () has an introduction port (I) and a discharge port (O) for discharging from the internal space MX the gas EGI introduced through the introduction port (I). The source () produces ions CP by gaseous discharge. The space forming portion () is configured such that the introduced gas EGI is discharged from the internal space MX through the discharge port (O), the gas under measurement EG is introduced into the internal space MX through the introduction port (I), and the introduced gas EGI is mixed with the ions CP produced by the ion source ().


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