The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
Mar. 17, 2015
Applicant:
Nihon Cabot Microelectronics K.k., Tsu-shi, JP;
Inventors:
Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1463 (2013.01); H01L 21/02024 (2013.01); H01L 21/30625 (2013.01);
Abstract
Provided are a slurry composition to be used in chemical mechanical polishing (CMP), and a method for polishing a substrate. This slurry composition contains water, abrasive grains, and an alkylene polyalkylene oxide amine polymer having a solubility parameter in a range of 9-10. A preferred alkylene polyalkylene oxide amine polymer is given by general formula (1). (In general formula (1), m and n are positive integers, and A and R are alkylene oxide groups.)
Quick Actions:
Masuda, Tsuyoshi. (2018). Slurry composition and method for polishing substrate (U.S. Patent No. 9914853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9914853
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile