The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2018

Filed:

Mar. 30, 2015
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Masayuki Eda, Tokyo, JP;

Susumu Okino, Tokyo, JP;

Ryuji Yoshiyama, Tokyo, JP;

Hideaki Sakurai, Tokyo, JP;

Nobuyuki Ukai, Tokyo, JP;

Hideo Suzuki, Tokyo, JP;

Hiroshi Nakashoji, Tokyo, JP;

Shigeru Yoshioka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 5/02 (2006.01); C02F 5/08 (2006.01); C02F 1/20 (2006.01); C02F 1/52 (2006.01); C02F 1/68 (2006.01); B03D 3/00 (2006.01); B01D 21/01 (2006.01); C02F 9/00 (2006.01); B01D 9/00 (2006.01); B01D 61/02 (2006.01); B01D 61/04 (2006.01); B01D 65/08 (2006.01); B01D 19/00 (2006.01); C02F 5/10 (2006.01); B01D 15/00 (2006.01); B01D 21/00 (2006.01); C02F 1/00 (2006.01); B01D 37/00 (2006.01); B01D 61/00 (2006.01); B01D 61/42 (2006.01); C02F 1/42 (2006.01); C02F 1/44 (2006.01); C02F 1/469 (2006.01); C02F 1/66 (2006.01); C02F 101/10 (2006.01); C02F 1/04 (2006.01); C02F 103/02 (2006.01);
U.S. Cl.
CPC ...
C02F 1/52 (2013.01); B01D 9/0036 (2013.01); B01D 19/0005 (2013.01); B01D 61/025 (2013.01); B01D 61/04 (2013.01); B01D 65/08 (2013.01); C02F 1/5281 (2013.01); C02F 9/00 (2013.01); B01D 61/42 (2013.01); B01D 2311/04 (2013.01); B01D 2311/12 (2013.01); B01D 2311/18 (2013.01); B01D 2311/2642 (2013.01); B01D 2311/2649 (2013.01); B01D 2311/2657 (2013.01); C02F 1/04 (2013.01); C02F 1/20 (2013.01); C02F 1/42 (2013.01); C02F 1/441 (2013.01); C02F 1/442 (2013.01); C02F 1/4691 (2013.01); C02F 1/4693 (2013.01); C02F 1/66 (2013.01); C02F 5/10 (2013.01); C02F 2001/007 (2013.01); C02F 2001/5218 (2013.01); C02F 2101/10 (2013.01); C02F 2101/101 (2013.01); C02F 2103/023 (2013.01); C02F 2209/06 (2013.01);
Abstract

Provided are a water treatment system and a water treatment process, which are capable of reproducing water containing salts with high water recovery. In the water treatment system () and the water treatment process of the present invention, after a calcium scale inhibitor and a silica scale inhibitor are supplied to water to be treated containing Ca ions, SOions, carbonate ions, and silica, and the water to be treated is separated in a second demineralizing section () into second concentrated water in which the Ca ions, the SOions, the carbonate ions, and the silica are concentrated and treated water. In a second crystallizing section (), seed crystals of gypsum are supplied to the second concentrated water, whereby gypsum is crystallized and removed from the second concentrated water.


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