The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Oct. 09, 2014
Applicant:

Oji Holdings Corporation, Tokyo, JP;

Inventors:

Yasuhito Kajita, Tokyo, JP;

Kei Shinotsuka, Tokyo, JP;

Kotaro Dai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/02 (2010.01); H01L 33/22 (2010.01); H01L 33/00 (2010.01); H01L 33/18 (2010.01); H01L 33/24 (2010.01); H01L 33/30 (2010.01); H01L 33/32 (2010.01);
U.S. Cl.
CPC ...
H01L 33/025 (2013.01); H01L 33/005 (2013.01); H01L 33/0062 (2013.01); H01L 33/0075 (2013.01); H01L 33/18 (2013.01); H01L 33/22 (2013.01); H01L 33/24 (2013.01); H01L 33/30 (2013.01); H01L 33/32 (2013.01);
Abstract

An upper surface of a substrate is etched using a first single-particle film as a mask. The first single-particle film is constituted of first particles having a first particle diameter. The upper surface of the substrate is etched using a second single-particle film as a mask. The second single-particle film is constituted of second particles having a second particle diameter. The second particle diameter is different from the first particle diameter.


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