The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Jan. 03, 2017
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Joy Cheng, San Jose, CA (US);
Michael A. Guillorn, Cold Springs, NY (US);
Chi-Chun Liu, Altamont, NY (US);
Hsinyu Tsai, White Plains, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 21/308 (2006.01); H01L 21/033 (2006.01); H01L 21/768 (2006.01); C08L 53/00 (2006.01); G03F 7/00 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); H01L 21/0274 (2013.01); H01L 21/0337 (2013.01); H01L 21/308 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31144 (2013.01); H01L 21/76816 (2013.01); B81C 2201/0198 (2013.01); C08L 53/00 (2013.01); C08L 53/005 (2013.01); G03F 1/00 (2013.01); G03F 7/0002 (2013.01);
Abstract
After forming spacers over a hard mask layer using a sidewall image transfer process, a neutral material layer is formed on the portions of the hard mask layer that are not covered by the spacers. The spacers and the neutral material layer guide the self-assembly of a block copolymer material. The microphase separation of the block copolymer material provides a lamella structure of alternating domains of the block copolymer material.