The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Nov. 01, 2012
Applicant:

Kobe Steel, Ltd., Kobe-shi, JP;

Inventors:

Satoshi Hirota, Takasago, JP;

Naoyuki Goto, Takasago, JP;

Homare Nomura, Takasago, JP;

Rainer Cremer, Monschau, DE;

Assignee:

Kobe Steel, Ltd., Kobe-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 13/00 (2006.01); H01J 37/32 (2006.01); C23C 14/02 (2006.01); C23C 14/32 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32018 (2013.01); C23C 14/022 (2013.01); C23C 14/325 (2013.01); C23C 14/54 (2013.01); C23C 14/564 (2013.01); H01J 37/32403 (2013.01); H01J 37/32862 (2013.01);
Abstract

In an ion bombardment apparatus of the present invention, a heating type thermal electron emission electrode formed by a filament is placed on one inner surface of a vacuum chamber, an anode for receiving a thermal electron from the thermal electron emission electrode is placed on another inner surface of the vacuum chamber, and a base material is placed between the thermal electron emission electrode and the anode. Further, the ion bombardment apparatus has a discharge power supply for generating a glow discharge upon application of a potential difference between the thermal electron emission electrode and the anode, a heating power supply for heating the thermal electron emission electrode so as to emit the thermal electron, and a bias power supply for applying negative pulse-shaped bias potential with respect to the vacuum chamber to the base material.


Find Patent Forward Citations

Loading…