The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Jul. 05, 2013
Eth Zurich, Zurich, CH;
Nadia Gambino, Zurich, CH;
Reza Abhari, Forch, CH;
Flori Alickaj, Hombrechtikon, CH;
Felix Daners, Schaffhausen, CH;
Andrea Giovannini, Lugano, CH;
Oran Morris, Dublin, IE;
Bob Rollinger, Zurich, CH;
ETH Zurich, , CH;
Abstract
A method for controlling an interaction between droplet targets and a high power and high-repetition-rate laser beam at a laser focus position of the laser beam including providing a droplet generator for generating a train of droplets as a droplet target with a predetermined droplet frequency and velocity in a predetermined direction; providing a high power, high-repetition-rate laser for emitting a pulsed laser beam, which is focused in the laser focus position; aligning the droplet generator such that the train of droplets runs through the laser focus position; generating a train of droplets as a droplet target; and emitting a pulsed laser beam in synchronization with the train of droplets, such that the droplet target interacts with the pulsed laser beam at the laser focus position.