The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Dec. 18, 2015
Applicants:
Michael Gormish, Menlo Park, CA (US);
Edward Schwartz, Menlo Park, CA (US);
Inventors:
Michael Gormish, Menlo Park, CA (US);
Edward Schwartz, Menlo Park, CA (US);
Assignee:
Ricoh Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 11/60 (2006.01); G06K 9/46 (2006.01); G06K 9/62 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 11/60 (2013.01); G06K 9/4609 (2013.01); G06K 9/6215 (2013.01); G06K 9/6267 (2013.01); G06T 7/0042 (2013.01); G06K 2009/4666 (2013.01); G06T 2207/10016 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/20221 (2013.01);
Abstract
A system and method that determines a seam between pairs of adjacent images for panoramic image stitching is disclosed. The method includes receiving a sequence of images, determining a pair of adjacent images in the sequence of images, matching one or more objects corresponding to a same object identifier in the pair of adjacent images, determining a seam in an overlap region between the pair of adjacent images and determining a portion of pixels from each image of the pair of adjacent images to represent in a stitched panoramic image based on the seam.