The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Mar. 06, 2017
Nikon Corporation, Tokyo, JP;
Hiroyuki Nagasaka, Kumagaya, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
A liquid immersion exposure apparatus includes a liquid-immersion-area-forming-member having an opening through which an exposure light is projected, the-liquid-immersion-area-forming-member having a first liquid supply inlet facing downward, a second liquid supply inlet provided opposite to an outer surface of the final optical element, and a first removal outlet facing downward. A liquid immersion area is formed on a portion of an upper surface of a substrate while performing a liquid supply via the first liquid supply inlet to a gap between the liquid-immersion-area-forming-member and the upper surface of the substrate, a liquid supply via the second liquid supply inlet to a gap between the liquid-immersion-area-forming-member and a final optical element of a projection system and a liquid removal via the first removal outlet from the gap between the liquid-immersion-area-forming-member and the upper surface of the substrate.