The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Nov. 30, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Ken-ichiro Shinoda, Utsunomiya, JP;

Akiyoshi Suzuki, Tokyo, JP;

Mitsuru Hiura, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 59/02 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); B29C 43/02 (2006.01); B29C 43/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 43/021 (2013.01); B29C 43/58 (2013.01); B29C 59/02 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); B29C 2059/023 (2013.01);
Abstract

An apparatus for bringing a mold having a pattern region and a first mark into contact with an imprint material on a substrate having a second mark, includes a deforming mechanism configured to deform the mold such that a portion of the mold where the first mark is formed protrudes toward the substrate, a driving mechanism configured to adjust a distance between the mold and the substrate, and a detecting unit configured to detect, after the driving mechanism starts an operation of reducing the distance, the first mark and the second mark in a state in which the portion of the mold and the imprint material on the substrate are in contact with each other but a whole of the pattern region is not in contact with the imprint material.


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