The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Jan. 11, 2013
Rodenstock Gmbh, Munich, DE;
Helmut Altheimer, Baisweil-Lauchdorf, DE;
Wolfgang Becken, Munich, DE;
Gregor Esser, Munich, DE;
Anne Seidemann, Munich, DE;
Werner Mueller, Munich, DE;
Rodenstock GmbH, Munich, DE;
Abstract
A computer-implemented method for calculating or optimizing a spectacle lens for at least one eye of a spectacle wearer. Refraction data of the at least one eye of the spectacle wearer is collected. An individual eye model is defined, wherein the eye model defines at least the topography of a corneal front surface of the at least one eye, position and power of a lens of the eye, and a retina position of the eye such that the eye exhibits the collected refraction data. A first surface and a second surface for the spectacle lens to be calculated or optimized is specified. The path of a main ray through at least one visual point of at least one spectacle lens surface to be calculated or optimized is determined. A spherical wavefront incident on the first surface of the spectacle lens along the main ray is specified. A wavefront in the at least one eye, which results from the spherical wavefront in a surrounding of the main ray due to the power of at least the first and second surfaces of the spectacle lens, the corneal front surface, and the lens of the at least one eye is determined. The at least one spectacle lens surface to be calculated or optimized is iteratively varied until an aberration of the resulting wavefront corresponds to a specified target aberration.