The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Jun. 30, 2015
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Tuomas Vallius, Espoo, FI;

Lauri Sainiemi, Espoo, FI;

Tapani Levola, Tampere, FI;

Marco Mattila, Espoo, FI;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/01 (2006.01); G02B 27/42 (2006.01); G02B 27/00 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0101 (2013.01); G02B 5/1819 (2013.01); G02B 5/1852 (2013.01); G02B 27/0081 (2013.01); G02B 27/0172 (2013.01); G02B 27/4205 (2013.01); G02B 27/4272 (2013.01); G02B 2027/0125 (2013.01); G02B 2027/0178 (2013.01);
Abstract

In an optical system that includes a waveguide with multiple diffractive optical elements (DOEs) incorporating diffraction gratings, light exiting a trailing edge of an upstream DOE enters a leading edge of a downstream DOE. One or more of the DOEs may include a leading and/or a trailing edge that have a graded profile. At a graded trailing edge of an upstream DOE, grating height smoothly decreases from full height to shallow height as a function of the proximity to the trailing edge. At a graded leading edge of the downstream DOE grating height smoothly increases from shallow height to full height as a function of distance away from the leading edge. By reducing a sharp boundary at the interface between the upstream and downstream DOEs, the graded profiles of the DOE edges enable optical resolution to be maintained decreasing sensitivity to misalignment between the DOEs that may occur during manufacturing.


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