The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Jan. 16, 2015
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Ertugrul Berkcan, Clifton Park, NY (US);

Yongjae Lee, Latham, NY (US);

Assignee:

GENERAL ELECTRIC COMPANY, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01H 1/00 (2006.01); F01D 21/00 (2006.01); G01H 13/00 (2006.01); G01M 99/00 (2011.01); F01D 17/02 (2006.01); F01D 17/20 (2006.01);
U.S. Cl.
CPC ...
F01D 21/00 (2013.01); F01D 17/02 (2013.01); F01D 17/20 (2013.01); F01D 21/003 (2013.01); G01H 13/00 (2013.01); G01M 99/00 (2013.01); Y02T 50/672 (2013.01);
Abstract

A machine includes a machine substrate and a dielectric layer formed over at least a portion of the machine substrate. A monitoring system for the machine includes a sensor subsystem that includes a first portion of the machine substrate and a portion of the machine dielectric layer formed over the first portion of the machine substrate. The monitoring system also includes a sensor electromagnetic structure disposed on the portion of the machine dielectric layer. The sensor electromagnetic structure includes at least one sensor conducting subcomponent. The sensor electromagnetic structure is configured to regulate electromagnetic fields incident thereto in response to at least one measurement characteristic of a machine measurand. The sensor subsystem is configured to obtain at least one measurement characteristic of the machine measurand proximate a machine sensing position.


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