The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Dec. 03, 2014
Applicant:

Hemlock Semiconductor Corporation, Hemlock, MI (US);

Inventors:

Arvid Neil Arvidson, Sanford, MI (US);

Terence Lee Horstman, Frankenmuth, MI (US);

Michael John Molnar, Freeland, MI (US);

Chris Tim Schmidt, Auburn, MI (US);

Roger Dale Spencer, Jr., Midland, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/02 (2006.01); C30B 15/00 (2006.01); C30B 29/06 (2006.01); C30B 11/00 (2006.01); C30B 15/04 (2006.01); B07B 1/46 (2006.01); B07B 13/04 (2006.01);
U.S. Cl.
CPC ...
C30B 15/002 (2013.01); B07B 1/4654 (2013.01); B07B 13/04 (2013.01); C30B 11/001 (2013.01); C30B 11/003 (2013.01); C30B 15/02 (2013.01); C30B 15/04 (2013.01); C30B 29/06 (2013.01); Y10T 117/1056 (2015.01);
Abstract

A method for recharging a crucible with polycrystalline silicon comprises adding flowable chips to a crucible used in a Czochralski-type process. Flowable chips are polycrystalline silicon particles made from polycrystalline silicon prepared by a chemical vapor deposition process, and flowable chips have a controlled particle size distribution, generally nonspherical morphology, low levels of bulk impurities, and low levels of surface impurities. Flowable chips can be added to the crucible using conventional feeder equipment, such as vibration feeder systems and canister feeder systems.


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