The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

May. 18, 2010
Applicants:

Ekkehard Mueh, Rheinfelden, DE;

Hartwig Rauleder, Rheinfelden, DE;

Jaroslaw Monkiewicz, Rheinfelden, DE;

Reinhold Schork, Rheinfelden, DE;

Inventors:

Ekkehard Mueh, Rheinfelden, DE;

Hartwig Rauleder, Rheinfelden, DE;

Jaroslaw Monkiewicz, Rheinfelden, DE;

Reinhold Schork, Rheinfelden, DE;

Assignee:

Evonik Degussa GmbH, Essen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01);
U.S. Cl.
CPC ...
C01B 33/107 (2013.01); C01B 33/10773 (2013.01); C01B 33/10784 (2013.01); C01P 2006/80 (2013.01);
Abstract

The invention relates to a process for dismutating at least one halosilane and reducing the content of extraneous metal and/or a compound containing extraneous metal in the at least one halosilane and in the at least one silane obtained, by contacting at least one halosilane of the general formula I, HSiCl(I), where n and m are integers and n=1, 2 or 3 and m=1, 2 or 3 and n+m=4, with a particulate, organic, amino-functional resin to obtain at least one silane of the general formula II, HSiCl(II), where a and b are integers and a=0, 2, 3 or 4 and b=0, 1, 2 or 4 where a+b=4, in one step, in which the content of extraneous metal and/or compounds containing extraneous metal has been reduced compared to the halosilane of the formula I. The invention further provides for the use of this resin for dismutating halosilanes and as an absorbent of extraneous metals or compounds containing extraneous metal in a process for preparing monosilane.


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