The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Apr. 30, 2015
Applicant:
National Taiwam University, Taipei, TW;
Inventors:
I-Chun Cheng, Taipei, TW;
Jian-Zhang Chen, Taipei, TW;
Cheng-Che Hsu, Taipei, TW;
Pi-Tai Chou, Taipie, TW;
Hsiao-Wei Liu, Taipei, TW;
Haoming Chang, Taipei, TW;
Sheng-Ping Liang, Taipei, TW;
Ting-Jui Wu, Taipei, TW;
Assignee:
NATIONAL TAIWAN UNIVERSITY, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/06 (2006.01); C01B 31/04 (2006.01); C23C 18/12 (2006.01); H01J 37/32 (2006.01); C23C 18/14 (2006.01); C23C 4/134 (2016.01);
U.S. Cl.
CPC ...
C01B 31/043 (2013.01); C01B 31/0484 (2013.01); C23C 4/134 (2016.01); C23C 18/1262 (2013.01); C23C 18/1295 (2013.01); C23C 18/14 (2013.01); H01J 37/32357 (2013.01);
Abstract
A method and apparatus for treating graphene raw material by plasma, and an application thereof are provided. After treated by the plasma, the graphene raw material will have a special structure and characteristic.