The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2018

Filed:

Aug. 06, 2013
Applicants:

Mitsubishi Rayon Co., Ltd., Tokyo, JP;

Kanagawa Academy of Science and Technology, Kawasaki-shi, Kanagawa, JP;

Inventors:

Masashi Ikawa, Otake, JP;

Eiko Okamoto, Otake, JP;

Hiroshi Onomoto, Otake, JP;

Jitsuo Hirohata, Otake, JP;

Yuji Matsubara, Otake, JP;

Hideki Masuda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 11/04 (2006.01); C25D 11/10 (2006.01); C25D 5/18 (2006.01); C25D 21/12 (2006.01); B29C 33/38 (2006.01); C25D 1/10 (2006.01); C25D 5/48 (2006.01); C25D 7/00 (2006.01); C25D 9/06 (2006.01); C25D 11/02 (2006.01); C25D 11/12 (2006.01); C25D 11/24 (2006.01);
U.S. Cl.
CPC ...
B29C 33/3842 (2013.01); C25D 1/10 (2013.01); C25D 5/48 (2013.01); C25D 7/00 (2013.01); C25D 9/06 (2013.01); C25D 11/024 (2013.01); C25D 11/045 (2013.01); C25D 11/10 (2013.01); C25D 11/12 (2013.01); C25D 11/24 (2013.01); C25D 21/12 (2013.01); B29K 2905/02 (2013.01);
Abstract

The present invention relates to a method of manufacturing a mold having an oxide film with a plurality of pores formed on a surface of an aluminum substrate, the method including (a) a process of applying a voltage to a machined aluminum substrate and anodizing a surface of the aluminum substrate to form an oxide film; and (b) a process of removing at least a part of the oxide film formed in the process (a), wherein a voltage (V[V]) immediately before the process (a) is terminated and a time (t[sec]) required to reach the voltage (V[V]) after starting the application of voltage satisfy the following Equation (i) in the process (a).0.010<  (i)


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