The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2018
Filed:
Apr. 09, 2015
Indian Institute of Technology Kanpur, Kanpur, Uttar Pradesh, IN;
INDIAN INSTITUTE OF TECHNOLOGY KANPUR, Kanpur, IN;
Abstract
Methods of forming a hierarchical porous monolith are provided. The methods include mixing a monomer, a silica precursor and a catalyst in a solvent to form a mixture. The methods also include adding a gelling agent to the mixture to form a polymer-silica composite gel. The polymer-silica composite gel undergoes a phase separation to separate from the solvent and the unreacted silica precursor. The method further includes drying the polymer-silica composite gel to evaporate the solvent to form a polymer-silica monolith and processing the polymer-silica monolith to form at least one of a polymer monolith, a carbon monolith, a silica monolith and a carbon-silica monolith.