The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Apr. 23, 2014
Applicant:

Lockheed Martin Corporation, Bethesda, MD (US);

Inventors:

James L. Lovejoy, Jr., Colorado Springs, CO (US);

Thomas Patrick Cencich, Littleton, CO (US);

W. Neill Kefauver, Littleton, CO (US);

Assignee:

LOCKHEED MARTIN CORPORATION, Bethesda, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01Q 1/50 (2006.01); H03H 7/38 (2006.01); H01Q 21/00 (2006.01);
U.S. Cl.
CPC ...
H03H 7/38 (2013.01); H01Q 1/50 (2013.01); H01Q 21/0087 (2013.01);
Abstract

A radio-frequency (RF) antenna with wideband impedance matching includes a first conductive layer, a second conductive layer, and patterned connections. The first conductive layer is formed on a first surface of a dielectric material. The second conductive layer is formed on a second surface of the dielectric material. The patterned connections between the first conductive layer and the second conductive layer are formed through multiple vias to enable the wideband impedance matching. The first conductive layer and the second conductive layer are formed based on an antenna-layout pattern. The multiple vias are formed based on a via pattern that corresponds to the antenna-layout pattern.


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