The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2018

Filed:

Jul. 28, 2015
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Boe Optoelectronics Technology Co., Ltd., Anhui, CN;

Inventor:

Huaiwei Yang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G03F 7/20 (2006.01); G03F 1/24 (2012.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G03F 1/24 (2013.01); G03F 7/2045 (2013.01);
Abstract

The present disclosure provides a mask plate, including a first region corresponding to a GOA region of an array substrate and a second region corresponding to a display region of the array substrate. The first region comprises at least one first aperture, the at least one first aperture is used to form a GI via-hole penetrating through a gate insulating layer at the GOA region, and a gate line is exposed through the GI via-hole. The second region comprises at least one second aperture, the at least one second aperture is a half-tone mask aperture and is used to form a VIA via-hole at the display region, and a source/drain metal layer pattern is exposed through the VIA via-hole.


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